This book elucidates the reasons underlying the lasting success of dnq n resist systems by examining the correlation between the chemical structure of the components and the photoresist performance the basic chemistry of both dnq sensitizers and novolak resins are explored focus also is placed on the chemical basis of application related facets of the lithographic process. Optical engineering ebooks advanced search home ebooks diazonaphthoquinone based resists access to ebooks is limited to institutions that have purchased or currently subscribe to the spie ebooks program ebooks are not available via an individual subscription publish a short tutorial or overview open calls for spotlights access . This volume in the spie tutorial text series presents a practical approach to optical testing with emphasis on techniques procedures and instrumentation rather than mathematical analysis the author provides the reader with a basic understanding of the measurements made and the tools used to make those measurements. Spie tutorial texts tt11 more in this series spie digital library more in this series tutorial texts in optical engineering v tt 11 summary note this book elucidates the reasons underlying the lasting success of dnq n resist systems by examining the correlation between the chemical structure of the components and the photoresist
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